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Atomic Layer Deposition (ALD) Liquid Injection Valve

By Design World Staff | February 11, 2009

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In atomic layer deposition (ALD) processes, the use of liquid precursors is on the rise. In response, Swagelok has introduced the Swagelok‚® ALD liquid injection valve.

With liquid precursor vaporization technology, high temperatures are required to vaporize a liquid chemical within the valve body. The chemistry is then delivered to the ALD chamber. For consistent precursor delivery, temperature must be tightly controlled.

feb-dfi-2.jpg

The new valve vaporizes liquid precursors inside its body, and then dispenses them and purges gases into ALD tool chambers in precisely measured, precisely timed pulses.

With a high-end PFA seat seal, the ALD liquid injection valve can handle temperatures up to 200‚° C (392‚° F). Temperature control is achieved through heater cartridges optimally placed in the ALD diaphragm valve body. Swagelok uses Finite Element Analysis (FEA) to simulate the temperature
effect, enabling custom placement of the heater cartridges according to a tool manufacturer‚’s particular needs.

Manufactured from 316L VIM/VAR stainless steel, the valve body is available with 1/4 in. VCR‚® metal gasket face seal and 1/4 in. and 6 mm tube butt weld end connections. Other available options include a high-flow model, as well as multi-port, multi-valve manifold, and modular surface mount configurations. 

Swagelok Co.

www.swagelok.com

::Design World::


Filed Under: Semiconductor, Fluid power, Valves

 

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