The new 40 nm-rated filter, intended for use with chemicals in wet processes and distribution systems, provides 40 nm retention while maintaining the flow of next-best-in-class 50 nm filters.
For semiconductor fabs, the drop-in substitution filters can upgrade retention performance and reduce particle counts while maintaining desired flow rate, as well as enable reduced processing times, higher flow rates, and faster bath turnovers.
W.L. Gore & Associates, Inc.
Filed Under: Semiconductor, Materials • advanced
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