HAM-LET, a manufacturer of instrumentation valves and fittings for industrial and high purity applications, is launching PuRight™ – a new, enhanced stainless steel 316L material at Semicon West, during 8-10 July, booth no. 1539.
PuRight™ material – an enhanced version of 316L Stainless Steel – offers, lower inclusion content, low Carbon content for enhanced welding, low Sulfur content for enhanced electro-polishing and better corrosion resistance achieved by modification of key elements, such as: chromium (Cr), Molybdenum (Mo) and Nickel (Ni).
“Our newly-developed PuRight™ material is far more resistant to corrosion than previously available materials and less likely to pit than conventional 316L stainless steel,” said Felix Shestatski, VP Quality, Engineering and R&D at HAM-LET. “PuRight™ material is designed to achieve optimum surface quality after mechanical or electro-polishing processes. It is compatible with the SEMI-F20 standard, as well as with ASTM-A276 and ASTM-A479/ASME SA479 standards”.
The new product features superior resistance to pitting and crevice corrosion – especially in the presence of free-Chloride (Cl-) ions – and with its inherent properties, demonstrates improved performance in strongly-oxidizing acid media.
PuRight™ material should prove beneficial for use in applications within the semiconductor industry, where corrosive materials are utilized.
“This uniquely-designed alloy has a clear advantage in use for pressure or flow control devices, such as valves, fittings etc. With its excellent welding characteristics and meaningfully-high values of CPT, as well as high ratios of Cr/Fe and CrOx/FeOx, PuRight™ material should prove highly attractive to manufacturers of Ultra High Purity (UHP) products and is particularly well suited for use in the semiconductor industry,” Shestatski concluded.
HAM-LET is also releasing its new Ultra Fast (UF) Diaphragm Valve for Atomic Layer Deposition and fast switching applications, at Semicon West in San Francisco, booth no. 1539, from 8-10 July.
“Our UF’s unique flow adjustment mechanism, patent pending no. US 61/910,79, allows for exceptional flow tuning during operation,” said Eran Pintel, VP Marketing and Sales at HAM-LET.
“Another advantage of our UF diaphragm valve is its outstanding durability and low maintenance, as it offers over 100 million life cycles. The UF series meets the demand for high-precision diaphragm valves that can perform accurately and repeatedly over an extremely large number of cycles, required by ALD applications,” said Pintel.
The optional extended bonnet and cooling fin provide a superb solution when precise and repeatable performance in high-temperature applications is required. The UF series offers superior sealing performance and remarkable durability in hazardous environments, under severe demands of ultra fast actuation at high purity applications.
HAM-LET will showcase a live demonstration of the UF series at Semicon West 2014, booth no. 1539.