The GF100 series MFC with high-speed EtherCAT connectivity and the GF135 advanced diagnostic MFC help users meet critical gas chemistry control challenges and improve process yields for sub-20 nm nodes.
Responding to rapidly evolving requirements for next-generation tools and fabs, the GF100 series features several additions to help boost process yields and productivity:
- embedded diagnostics to leverage real-time EtherCAT data acquisition capabilities for fault detection and classification
- an ultra-stable flow sensor (less than 0.15% of S.P. drift per year) enables tighter low set point accuracy and reduces maintenance requirements
- improved valve shutdown reduces valve leak-by, minimizing potential first wafer effects
- enhancements to the GF100 pressure transient insensitivity to less than 1% of S.P. with 5 psi/sec pressure perturbations, which reduces crosstalk sensitivity for consistent mass flow delivery.
The GF135 is a “smart” pressure transient insensitive (PTI) MFC that can perform self-diagnostics, such as integral rate-of-decay flow measurement, without stopping the flow of process gas. This helps semiconductor manufacturers verify process gas accuracy, check valve leak-by, and monitor sensor stability in real time without removing the flow controller from the gas line, reducing downtime.
With this real-time error detection technology, users can reduce wafer scrap and lost production time from unacceptable flow deviations and unnecessary preventative maintenance checks. The GF135 PTI MFC also offers process gas accuracy and fast flow settling time for ascending and descending set points, helping improve productivity and chamber-to-chamber matching.
Filed Under: Semiconductor